ACW introduces a new line of LuxNIL® very high RI resins for P-NIL VR/AR/MR applications or other thin coatings. These resins are hybrid organic/inorganic, low viscosity formulations containing PGMEA. They are suitable for spin coating, gravure coating, or ink-jetting to give thicknesses of 100 nm to 3 microns after evaporation of the PGMEA. The cured resins have RI at 589 nm of 1.70 to 1.96 and can be tuned to specific RIs as required to minimize internal reflection.
The LuxNIL® high RI resins reflect ACW’s decades of development and production experience in information layer imprint technology, and we have addressed the major concerns for P-NIL. The result is a series of resins with very high RI, very low haze, good mechanical properties at the micron thickness level, and excellent adhesion to glass and silicon substrates. Click HERE to see a brochure with details about LuxNIL® resins or contact us at LuxNIL@addisoncw.com for more information and to discuss your applications.