ACW offers PFAS-free working stamp resins for both micro- and nano-imprint lithography applications. These materials offer the following advantages: PFAS-free, environmentally friendly and not restricted No anti-stick layer on the working stamp required in the imprint step, thus reducing process steps Excellent chemical resistance, resists etching from aggressive imprint resins and minimizes height gain in Read More…
Category: Working Stamp Resin
ACW has the Total Package for UV-NIL for AR/VR/MR: Working Stamp and High RI Resins
ACW has been designing, developing and manufacturing imprint lithography resins for two decades, since back when they were known as 2P resins. Our advances in the areas of working stamps and high refractive index (RI) resins have brought us to the point that we can provide the total package for UV nanoimprint lithography (UV-NIL) applications Read More…