In collaborative work, Addison Clear Wave and EV Group demonstrated commercially viable UV-NIL manufacturing processes. SmartNIL® processing of LuxNIL® resins gave the following results. Refractive Index: 1.82 – 1.96 at 633 nm Resolution: 50 nm Height Gain: 0.64 – 0.80 nm average for 25 imprints Download the jointly issued Whitepaper for details of the process Read More…
Category: Whitepapers
High Resolution, High Refractive Index Nano-Imprint Lithography with Sub-nm Height Gain
ACW teamed up with EV Group to demonstrate a new standard of performance for wafer-level high RI UV nano-imprint lithography (UV-NIL) for augmented/virtual/mixed reality applications. Using EV Group’s SmartNIL® process and ACW’s high RI LuxNIL® resins, the team achieved 50 nm resolution imprints with RI as high as 1.96 at 633 nm and sub-nm average Read More…