UV or photo Nano Imprint Lithography (UV-NIL or P-NIL) is a versatile technique for low-cost nanoscale device fabrication. The precise, direct patterning and repeatable replication of complex three-dimensional nanoscale patterns (submicron, 10’s of nanometers) in a single step make the NIL technique compelling in comparison to other expensive techniques such as e-beam or helium ion Read More…
High Performance Sealants, Adhesives and Coatings
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- Semiconductor Packaging
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- LiDAR Sensors Adhesives
- Wafer-Level Camera, High RI Optical Lens Resins
- Photo Nano-Imprint Lithography (P-NIL)
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- Hard Coats for Plastics or Glass, Laminating Adhesives
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