Category: Nano-Imprint Lithography

BD-400 is a high-performance photo nano-imprint lithography (P-NIL) resin.  In P-NIL, a thin layer of resin is coated on a mold or substrate and cured with UV light to give a positive pattern with resolution at the 10’s to 100’s of nanometer level.  BD-400 resin has excellent flow properties and can be spin-coated.  Its films Read More…

UV or photo Nano Imprint Lithography (UV-NIL or P-NIL) is a versatile technique for low-cost nanoscale device fabrication. The precise, direct patterning and repeatable replication of complex three-dimensional nanoscale patterns (submicron, 10’s of nanometers) in a single step make the NIL technique compelling in comparison to other expensive techniques such as e-beam or helium ion Read More…