Addison Clear Wave announces the release of a new family of high RI UV NIL resins targeted for AR/VR/MR applications. The LuxNIL® U resins exhibit order of magnitude increased UV stability compared to conventional high RI UV NIL resins as evaluated in “sunlight” exposure studies. The attached whitepaper compares the new LuxNIL® U resins with conventional high RI UV NIL resins.
Whitepaper key points:
- Exposure to “sunlight”
- UV stability increased 10-fold