ACW has been designing, developing and manufacturing imprint lithography resins for two decades, since back when they were known as 2P resins. Our advances in the areas of working stamps and high refractive index (RI) resins have brought us to the point that we can provide the total package for UV nanoimprint lithography (UV-NIL) applications for AR/VR/MR devices.
ACW offers PFAS-free working stamp resins such as FS-2400 (FS-2400-TDS) which has high Tg, high elasticity, and excellent chemical resistance and is designed for NIL applications. ACW’s LuxNIL® resins are organic/inorganic hybrids with RI as high as 1.96 at 589 nm. Combining ACW’s working stamps with their high RI LuxNIL® resins gives results such as those shown below. The first three images are for imprints of LuxNIL P285 resin with RI 1.90 at 589 nm using FS2400 working stamps. Slanted features were reproduced precisely, and a high aspect ratio of 1.1 micron tall features with 180 nm width is demonstrated. FS2400 also was used with EV Group’s UV-A2 resin to give the high aspect ratio imprint shown in the fourth image. (Click on the image for an enlarged view.)
Also of interest:
ACW’s UV-stabilized high RI resins
UV-NIL with sub-nm average height increase on 25 imprints
Contact ACW at info@addisoncw.com to discuss your UV-NIL applications or request samples.