LuxNIL® High Refractive Index Resins for UV Nanoimprint Lithography
ACW provides very high RI LuxNIL® resins for UV-NIL applications. These resins are organic/inorganic hybrids in PGMEA solvent suitable for spin coating, roll-to-roll coating or ink-jetting to give, after solvent removal, coatings or 100 nm to 3 microns. The RIs of LuxNIL® resins are 1.70 to 1.96 at 589 nm and can be tuned to customers’ specifications. The cured films have very low haze, 100% clarity, and 100% transmission, and they survive harsh environmental conditions of 85 °C and 85% RH essentially unchanged.
You can download a White Paper discussing LuxNIL® resins that was issued jointly by ACW and EV Group by clicking HERE. That paper details the high resolution and sub-nm height gain per imprint obtained for 25 imprints on a single working stamp.
Contact us at luxnil@addisoncw.com to discuss your applications.
Product | n589nm | Data Sheet |
LuxNIL P270 | 1.70 | TDS |
LuxNIL P276 | 1.81 | TDS |
LuxNIL P285 | 1.90 | TDS |
LuxNIL P289 | 1.96 | TDS |